Selective chemical vapor deposition on excimer-laser-patterned polytetrafluoroethylene from hexafluoroacetylacetonate copper (I) vinyltrimethylsilane

By Kodas T.T.   Perry W.L.   Hampden-Smith M.J.   Jain A.  

Thin Solid Films, Vol. 262, Iss. 1, 1995-06 ,pp. : 7-11

Elsevier

Access to resources Recommend Favorite

(hfac)Cu(I)(MP) (hfac=hexafluoroacetylacetonate, MP=4-methyl-1-pentene) and (hfac)Cu(I)(DMB) (DMB=3,3-dimethyl-1-butene) for the chemical vapor deposition of copper film

By Kang S.-W.   Han S.-H.   Rhee S.-W.  

Thin Solid Films, Vol. 350, Iss. 1, 1999-08 ,pp. : 10-13

Elsevier

Access to resources Recommend Favorite

Growth rate and microstructure of copper thin films deposited with metal-organic chemical vapor deposition from hexafluoroacetylacetonate copper(I) allyltrimethylsilane

By Son J.-H.   Park M.-Y.   Rhee S.-W.  

Thin Solid Films, Vol. 335, Iss. 1, 1998-11 ,pp. : 229-236

Elsevier

Access to resources Recommend Favorite

Deposition mechanism of MOCVD copper films in the presence of water vapor

By Kim J.-Y.   Lee Y.-K.   Park H.-S.   Park J.-W.   Park D.-K.   Joo J.-H.   Lee W.-H.   Ko Y.-K.   Reucroft P.J.   Cho B.-R.  

Thin Solid Films, Vol. 330, Iss. 2, 1998-09 ,pp. : 190-195

Elsevier

Access to resources Recommend Favorite

The chemical vapor deposition of copper and copper alloys

By Doppelt P.   Baum T.H.  

Thin Solid Films, Vol. 270, Iss. 1, 1995-12 ,pp. : 480-482

Elsevier

Access to resources Recommend Favorite