Thickness change in an annealed amorphous silicon film detected by spectroscopic ellipsometry

Author: Yamaguchi T.   Kaneko Y.   Jayatissa A.H.   Aoyama M.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.279, Iss.1, 1996-06, pp. : 174-179

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Abstract