Thickness change in an annealed amorphous silicon film detected by spectroscopic ellipsometry

By Yamaguchi T.   Kaneko Y.   Jayatissa A.H.   Aoyama M.  

Thin Solid Films, Vol. 279, Iss. 1, 1996-06 ,pp. : 174-179

Elsevier

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Real time analysis of amorphous and microcrystalline silicon film growth by multichannel ellipsometry

By Collins R.W.   Koh J.   Ferlauto A.S.   Rovira P.I.   Lee Y.   Koval R.J.   Wronski C.R.  

Thin Solid Films, Vol. 364, Iss. 1, 2000-03 ,pp. : 129-137

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Study of grain growth of polysilicon formed by nickel-induced-lateral-crystallization of amorphous silicon and subsequent high temperature annealing

By Qin M.   Poon M.C.   Fan L.J.   Chan M.   Yuen C.Y.   Chan W.Y.  

Thin Solid Films, Vol. 406, Iss. 1, 2002-03 ,pp. : 17-22

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Amorphous alloy formation and thickness dependent growth of Gd-silicides in solid phase thin film reaction

By Molnar G.L.   Peto G.   Zsoldos E.   Khanh N.Q.   Horvath Z.E.  

Thin Solid Films, Vol. 317, Iss. 1, 1998-04 ,pp. : 417-420

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Early stages of microcrystalline silicon film growth on amorphous substrate with SiH 4 gas heating

By Shirai H.   Arai T.  

Thin Solid Films, Vol. 296, Iss. 1, 1997-03 ,pp. : 19-22

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