A simple modification of the magnetron sputtering method for the deposition of boron-doped hydrogenated microcrystalline silicon films with enhanced doping efficiency

Author: Sharma S.N.   Das D.   Banerjee R.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.298, Iss.1, 1997-04, pp. : 200-210

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract