A novel approach to the formation of amorphous carbon nitride film on silicon by ECR-CVD

Author： Sung S.L.   Tseng C.H.   Chiang F.K.   Guo X.J.   Liu X.W.   Shih H.C.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.340, Iss.1, 1999-02, pp. : 169-174

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Large area microcrystalline silicon films grown by ECR-CVD

By Ferrero S.   Mandracci P.   Cicero G.   Giorgis F.   Pirri C.F.   Barucca G.  

Thin Solid Films, Vol. 383, Iss. 1, 2001-02 ,pp. : 181-184

Elsevier

Access to resources Recommend Favorite

Deposition of large area amorphous silicon films by ECR plasma CVD

By Ueda Y.   Inoue Y.   Shinohara S.   Kawai Y.  

Vacuum, Vol. 48, Iss. 2, 1997-02 ,pp. : 119-122

Elsevier

Access to resources Recommend Favorite

Boron doping effects and microcrystallite formation in SiC:H films prepared using ECR-CVD

By Yoon S.F.  

Vacuum, Vol. 48, Iss. 6, 1997-06 ,pp. : 503-507

Elsevier

Access to resources Recommend Favorite

Coverage properties of silicon nitride film prepared by the Cat-CVD method

By Osono S.   Uchiyama Y.   Kitazoe M.   Saito K.   Hayama M.   Masuda A.   Izumi A.   Matsumura H.  

Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. : 165-169

Elsevier

Access to resources Recommend Favorite

Oxidation processes in hydrogenated amorphous silicon nitride films deposited by ArF laser-induced CVD at low temperatures

By Banerji N.   Serra J.   Gonzalez P.   Chiussi S.   Parada E.   Leon B.   Perez-Amor M.  

Thin Solid Films, Vol. 317, Iss. 1, 1998-04 ,pp. : 214-218

Elsevier

Access to resources Recommend Favorite