Excited helium-induced CVD of a-Si 1-x C x :H films from trimethylchlorosilane

Author： Smirnova T.P. Yakovkina L.V. Ayupov B.M. Dolgpvesova I.P. Nadolinny V.A. Kitchay V.N.

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.353, Iss.1, 1999-09, pp. : 79-84

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