Effects of dilution ratio and seed layer on the crystallinity of microcrystalline silicon thin films deposited by hot-wire chemical vapor deposition

By Moutinho H.R.   Jiang C.-S.   Perkins J.   Xu Y.   Nelson B.P.   Jones K.M.   Romero M.J.   Al-Jassim M.M.  

Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. : 135-140

Elsevier

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Poly-crystalline silicon thin films prepared by plasma-assisted hot-wire chemical vapor deposition

By Liu F.   Zhu M.   Liu J.   Wang L.  

Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. : 182-185

Elsevier

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Intrinsic microcrystalline silicon prepared by hot-wire chemical vapour deposition for thin film solar cells

By Klein S.   Finger F.   Carius R.   Dylla T.   Rech B.   Grimm M.   Houben L.   Stutzmann M.  

Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. : 202-207

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The role of hydrogen dilution of silane and phosphorus doping on hydrogenated microcrystalline silicon ( c-Si:H) films prepared by hot-wire chemical vapor deposition (HW-CVD) technique

By Jadkar S.R.   Sali J.V.   Takwale M.G.   Musale D.V.   Kshirsagar S.T.  

Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. : 206-212

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Amorphous and microcrystalline silicon deposited by hot-wire chemical vapor deposition at low substrate temperatures: application to devices and thin-film microelectromechanical systems

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Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. : 105-111

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