Intrinsic amorphous and microcrystalline silicon by hot-wire-deposition for thin film solar cell applications

By Klein S.   Finger F.   Carius R.   Wagner H.   Stutzmann M.  

Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. : 305-309

Elsevier

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High-rate deposition of silicon thin-film solar cells by the hot-wire cell method

By Konagai M.   Tsushima T.   Kim M.-K.   Asakusa K.   Yamada A.   Kudriavtsev Y.   Villegas A.   Asomoza R.  

Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. : 152-156

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Amorphous and microcrystalline silicon deposited by hot-wire chemical vapor deposition at low substrate temperatures: application to devices and thin-film microelectromechanical systems

By Conde J.P.   Alpuim P.   Boucinha M.   Gaspar J.   Chu V.  

Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. : 105-111

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Effects of dilution ratio and seed layer on the crystallinity of microcrystalline silicon thin films deposited by hot-wire chemical vapor deposition

By Moutinho H.R.   Jiang C.-S.   Perkins J.   Xu Y.   Nelson B.P.   Jones K.M.   Romero M.J.   Al-Jassim M.M.  

Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. : 135-140

Elsevier

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Microstructures of microcrystalline silicon thin films prepared by hot wire chemical vapor deposition

By Zhu M.   Guo X.   Chen G.   Han H.   He M.   Sun K.  

Thin Solid Films, Vol. 360, Iss. 1, 2000-02 ,pp. : 205-212

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