Author: Ezoe K. Yamamoto T. Ishii K. Matsumoto S.
Publisher: Elsevier
ISSN: 0040-6090
Source: Thin Solid Films, Vol.369, Iss.1, 2000-07, pp. : 244-247
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
Morphological stability of TiSi 2 on polycrystalline silicon
Thin Solid Films, Vol. 293, Iss. 1, 1997-01 ,pp. :
The influence of TiN on cosputtered (Ti+Si) blanket film
Thin Solid Films, Vol. 424, Iss. 2, 2003-01 ,pp. :
The formation of TiSi 2 by RTA processing
Thin Solid Films, Vol. 298, Iss. 1, 1997-04 ,pp. :