Studies of the earliest stages of plasma-enhanced chemical vapor deposition of SiO 2 on polymeric substrates

Author: Dennler G.   Houdayer A.   Latreche M.   Segui Y.   Wertheimer M.R.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.382, Iss.1, 2001-02, pp. : 1-3

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Abstract