Ion-assisted low-temperature (=< 150 o C) epitaxial growth of TiN on Cu by reactive magnetron sputter deposition

By Ljungcrantz H.   Benhenda S.   Hakansson G.   Ivanov I.   Hultman L.   Greene J.E.   Sundgren J.-E.  

Thin Solid Films, Vol. 287, Iss. 1, 1996-10 ,pp. : 87-92

Elsevier

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Noble gas influence on reactive radio frequency magnetron sputter deposition of TiN films

By Lungu C.P.   Futsuhara M.   Takai O.   Braic M.   Musa G.  

Vacuum, Vol. 51, Iss. 4, 1998-12 ,pp. : 635-640

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TiN reactive sputter deposition studied as a function of the pumping speed

By Heuvelman W.M.   Helderman P.   Janssen G.C.A.M.   Radelaar S.  

Thin Solid Films, Vol. 332, Iss. 1, 1998-11 ,pp. : 335-339

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Influence of He, Ne and Kr addition in reactive Ar/N 2 dc magnetron plasma on TiN deposition

By Braic M.   Zoita C.N.   Braic V.   Kiss A.   Popescu M.   Musa G.  

Vacuum, Vol. 53, Iss. 1, 1999-05 ,pp. : 41-45

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Study of reactive DC magnetron sputtering deposition of AlN thin films

By Dechev D.A.   Dimitrova V.I.   Manova D.I.  

Vacuum, Vol. 49, Iss. 3, 1998-03 ,pp. : 193-197

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