A comparative study on reactive and non-reactive unbalanced magnetron sputter deposition of TiN coatings

By Mayrhofer P.H.   Kunc F.   Musil J.   Mitterer C.  

Thin Solid Films, Vol. 415, Iss. 1, 2002-08 ,pp. : 151-159

Elsevier

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Ion-assisted low-temperature (=< 150 o C) epitaxial growth of TiN on Cu by reactive magnetron sputter deposition

By Ljungcrantz H.   Benhenda S.   Hakansson G.   Ivanov I.   Hultman L.   Greene J.E.   Sundgren J.-E.  

Thin Solid Films, Vol. 287, Iss. 1, 1996-10 ,pp. : 87-92

Elsevier

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Influence of He, Ne and Kr addition in reactive Ar/N 2 dc magnetron plasma on TiN deposition

By Braic M.   Zoita C.N.   Braic V.   Kiss A.   Popescu M.   Musa G.  

Vacuum, Vol. 53, Iss. 1, 1999-05 ,pp. : 41-45

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TiN reactive sputter deposition studied as a function of the pumping speed

By Heuvelman W.M.   Helderman P.   Janssen G.C.A.M.   Radelaar S.  

Thin Solid Films, Vol. 332, Iss. 1, 1998-11 ,pp. : 335-339

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Microcrystalline silicon thin films prepared by RF reactive magnetron sputter deposition

By Cerqueira M.F.   Rebouta L.   Andritschky M.   Ferreira J.A.   Da Silva M.F.  

Vacuum, Vol. 46, Iss. 12, 1995-12 ,pp. : 1385-1390

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