An original approach for the fabrication of Si/SiO 2 multilayers using reactive magnetron sputtering

Author： Ternon C.   Gourbilleau F.   Portier X.   Voivenel P.   Dufour C.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.419, Iss.1, 2002-11, pp. : 5-10

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