Effect of substrate roughness on Mo/Si multilayer optics for EUVL produced by UHV-e-beam evaporation and ion polishing

Author： Kleineberg U. Westerwalbesloh T. Hachmann W. Heinzmann U. Tummler J. Scholze F. Ulm G. Mullender S.

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.433, Iss.1, 2003-06, pp. : 230-236

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Interface growth mechanism in ion beam sputtering-deposited Mo/Si multilayers

By Largeron C.

Philosophical Magazine, Vol. 86, Iss. 19, 2006-07 ,pp. : 2865-2879

Taylor & Francis Ltd

Access to resources Recommend Favorite

Mo/Si multilayers for EUV lithography by ion beam sputter deposition

By Chasse T. Neumann H. Ocker B. Scherer M. Frank W. Frost F. Hirsch D. Schindler A. Wagner G. Lorenz M. Otto G. Zeuner M. Rauschenbach B.

Vacuum, Vol. 71, Iss. 3, 2003-05 ,pp. : 407-415

Elsevier

Access to resources Recommend Favorite

The nature of ion milling damage in MoSi 2

By Boldt P. Weatherly G.C. Embury J.D.

Philosophical Magazine Letters, Vol. 75, Iss. 2, 1997-02 ,pp. : 97-104

Taylor & Francis Ltd

Access to resources Recommend Favorite

Low-fluence femtosecond-laser interaction with a Mo/Si multilayer stack

By Höche T.

Applied Physics A, Vol. 79, Iss. 4-6, 2004-09 ,pp. : 961-963

Springer Publishing Company

Access to resources Recommend Favorite

High-resolution Auger depth profiling of multilayer structures Mo/Si, Mo/B 4 C, Ni/C

By Andreev S.S. Akhsakhalyan A.D. Drozdov M.N. Polushkin N.I. Salashchenko N.N.

Thin Solid Films, Vol. 263, Iss. 2, 1995-07 ,pp. : 169-174

Elsevier

Access to resources Recommend Favorite