AES analysis of silicon nitride formation by 10 keV N + and N 2 + ion implantation

Author: Pan J.S.   Wee A.T.S.   Huan C.H.A.   Tan H.S.   Tan K.L.  

Publisher: Elsevier

ISSN: 0042-207X

Source: Vacuum, Vol.47, Iss.12, 1996-12, pp. : 1495-1499

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Abstract