Selective area deposition of a-C:H films as masks for anisotropic etching of crystalline silicon in aqueous potassium hydroxide

Author： Fissore A. Alves M.A.R. Da Silva Braga E. Cescato L.

Publisher： Elsevier

ISSN： 0042-207X

Source： Vacuum, Vol.49, Iss.1, 1998-01, pp. : 49-50

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