Author: Lindenmajer J. Hegman N. Meszaros S. Vad K. Langer G. Csik A.
Publisher: Elsevier
ISSN: 0042-207X
Source: Vacuum, Vol.50, Iss.3, 1998-07, pp. : 413-416
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
Dielectric properties of TiO 2 -films reactively sputtered from Ti in an RF magnetron
By Alexandrov P. Koprinarova J. Todorov D.
Vacuum, Vol. 47, Iss. 11, 1996-11 ,pp. :
Mechanical properties of r.f. magnetron sputtered indium tin oxide films
Thin Solid Films, Vol. 293, Iss. 1, 1997-01 ,pp. :