Effects of high dose Bi+ implantation on Si : An atomic force and transmission electron microscopy study

Author: Angelov C.   Faure J.   Kalitzova M.   Simov S.   Tzvetkova T.   Djakov A.  

Publisher: Elsevier

ISSN: 0042-207X

Source: Vacuum, Vol.51, Iss.2, 1998-10, pp. : 285-288

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