Crystallinity and stoichiometry of InN x films deposited by reactive dc magnetron sputtering

Author: Song P.K.   Sato D.   Kon M.   Shigesato Y.  

Publisher: Elsevier

ISSN: 0042-207X

Source: Vacuum, Vol.66, Iss.3, 2002-08, pp. : 373-378

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Abstract