Deposition of High Purity Parylene- F Using Low Pressure Low Temperature Chemical Vapor Deposition

Author: Wu P.   Yang G.   You L.   Mathur D.   Cocoziello A.   Lang C.   Moore J.   Lu T.   Bakru H.  

Publisher: Springer Publishing Company

ISSN: 1543-186X

Source: Journal of Electronic Materials, Vol.26, Iss.8, 1997-08, pp. : 949-953

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