Anisotropic deposition of copper by H-assisted plasma chemical vapor deposition

Author： Takenaka K.   Shiratani M.   Onishi M.   Takeshita M.   Kinoshita T.   Koga K.   Watanabe Y.  

Publisher： Elsevier

ISSN： 1369-8001

Source： Materials Science in Semiconductor Processing, Vol.5, Iss.2, 2002-04, pp. : 301-304

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