Online monitoring of the passivation breakthrough during deep reactive ion etching of silicon using optical plasma emission spectroscopy

Author: Leopold S   Mueller L   Kremin C   Hoffmann M  

Publisher: IOP Publishing

ISSN: 0960-1317

Source: Journal of Micromechanics and Microengineering, Vol.23, Iss.7, 2013-07, pp. : 74001-74006

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