Patterning of titanium oxide nanostructures by electron-beam lithography combined with plasma etching

Author： Hotovy I Kostic I Nemec P Predanocy M Rehacek V

E-ISSN： 1361-6439|25|7|74006-74012

ISSN： 0960-1317

Source： Journal of Micromechanics and Microengineering, Vol.25, Iss.7, 2015-07, pp. : 74006-74012

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Abstract

Patterning of metal oxide nanostructures with precisely controlled geometries and spacings can play an important role in the improvement of sensors for gas detection. Titanium oxide thin films were deposited on oxidized silicon substrates by reactive magnetron sputtering at room temperature. Patterning of TiO₂ nanostructures was conducted by electron beam lithography combined with plasma etching. It was found that for 120 nm-thick TiO₂ nanostructure formation, HSQ e-beam resists and Cr films prove to be suitable mask materials. Experimental results showed that the size of TiO₂ nanostructures depends mainly on the e-beam lithography process and they can be controlled by the design geometry and the exposure dose. TiO₂ nanostructures with a minimal diameter of 70 nm and spacing of 200 nm were successfully fabricated by ICP etching in CF₄/Ar plasma through negative e-beam resist HSQ.