Lithography and doping in strained Si towards atomically precise device fabrication

Author： Lee W C T   McKibbin S R   Thompson D L   Xue K   Scappucci G   Bishop N   Celler G K   Carroll M S   Simmons M Y  

Publisher： IOP Publishing

ISSN： 0957-4484

Source： Nanotechnology, Vol.25, Iss.14, 2014-04, pp. : 145302-145309

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