Beam pen lithography based on arrayed polydimethylsiloxane (PDMS) micro-pyramids spin-coated with carbon black photo-resist

Author： Chen Yu-Zen   Wu Chun-Ying   Lee Yung-Chun  

Publisher： IOP Publishing

ISSN： 0960-1317

Source： Journal of Micromechanics and Microengineering, Vol.24, Iss.4, 2014-04, pp. : 45007-45013

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