Metal-assisted chemical etching for very high aspect ratio grooves in n-type silicon wafers

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Journal of Micromechanics and Microengineering, Vol. 24, Iss. 12, 2014-12 ,pp. : 125026-125031

IOP Publishing

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Fabrication of a Polymer High-Aspect-Ratio Pillar Array Using UV Imprinting

By Shinohara Hidetoshi   Goto Hiroshi   Kasahara Takashi   Mizuno Jun  

Micromachines, Vol. 4, Iss. 2, 2013-04 ,pp. : 157-167

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Molybdenum etching using an SF₆, BCl₃ and Ar based recipe for high aspect ratio MEMS device fabrication

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Journal of Micromechanics and Microengineering, Vol. 23, Iss. 7, 2013-07 ,pp. : 75025-75032

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Fabrication of Ni stamp with high aspect ratio, two-leveled, cylindrical microstructures using dry etching and electroplating

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Fabrication of High-Aspect-Ratio 3D Hydrogel Microstructures Using Optically Induced Electrokinetics

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