Low-loss silicon waveguides with sidewall roughness reduction using a SiO2 hard mask and fluorine-based dry etching

Publisher： IOP Publishing

E-ISSN： 1361-6439|25|1|15003-15010

ISSN： 0960-1317

Source： Journal of Micromechanics and Microengineering, Vol.25, Iss.1, 2015-01, pp. : 15003-15010

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

A Compact Low-Pass Filter Based on the Fe3O4@SiO2-CCTO-Epoxy Composite Film

By Yang Wenhu   Yu Shuhui   Sun Rong   Du Ruxu  

Integrated Ferroelectrics, Vol. 142, Iss. 1, 2013-01 ,pp. : 61-72

Taylor & Francis Ltd

Access to resources Recommend Favorite

Loss reduction on ultra high lift low-pressure turbine blades using selective roughness and wake unsteadiness

By  

The Aeronautical Journal, Vol. 111, Iss. 1118, 2007-04 ,pp. : 257-266

Cambridge University Press

Access to resources Recommend Favorite

Prediction of silicon dry etching using a piecewise linear algorithm

By Jimenez-Fernandez V.M.   Reyes-Betanzo C.   Angelica-Cerdan M.   Hernandez-Paxtian Z.J.   Vazquez-Leal H.   Itzmoyotl-Toxqui A.  

Journal of the Chinese Institute of Engineers, Vol. 36, Iss. 7, 2013-10 ,pp. : 941-950

Taylor & Francis Ltd

Access to resources Recommend Favorite

Sidewall Surface Roughness of Sputtered Silicon I: Surface Modelling

By Ali M. Y.   Hung N. P.   Ngoi B. K. A.   Yuan S.  

Surface Engineering, Vol. 19, Iss. 2, 2003-04 ,pp. : 97-103

Maney Publishing

Access to resources Recommend Favorite

Sidewall Surface Roughness of Sputtered Silicon II: Model Verification

By Ali M. Y.   Hung N. P.   Ngoi B. K. A.   Yuan S.  

Surface Engineering, Vol. 19, Iss. 2, 2003-04 ,pp. : 104-108

Maney Publishing

Access to resources Recommend Favorite