A simple modification of the magnetron sputtering method for the deposition of boron-doped hydrogenated microcrystalline silicon films with enhanced doping efficiency

Author： Sharma S.N.   Das D.   Banerjee R.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.298, Iss.1, 1997-04, pp. : 200-210

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