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Effect of hydrogen radical exposure on the interfacial and bulk structure of a-Si:H/a-SiNx:H multilayer films

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Multilayer structures induced by plasma and laser beam treatments on a-Si:H and a-SiC:H thin films

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Properties of thin Ta-N films reactively sputtered on Cu/SiO 2 /Si substrates

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Reactively sputtered ternary films of the type TM-Si-N and their properties (TM=early transition metal)

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