Structure of plasma-deposited amorphous hydrogenated boron-carbon thin films

By Jacob W.   Annen A.   Sasz M.   Beckmann R.   Von Keudell A.  

Thin Solid Films, Vol. 312, Iss. 1, 1998-01 ,pp. : 147-155

Elsevier

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Influence of the process parameters on the properties of hydrogenated amorphous carbon thin films deposited using ECR plasma

By Piazza F.   Arnal Y.   Grambole D.   Herrmann F.   Kildemo M.   Lacoste A.   Relihan G.   Golanski A.  

Thin Solid Films, Vol. 383, Iss. 1, 2001-02 ,pp. : 196-199

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Amorphous hydrogenated carbon nitride films deposited via an expanding thermal plasma at high growth rates

By de Graaf A.   Dinescu G.   Longueville J.L.   van de Sanden M.C.M.   Schram D.C.   Dekempeneer E.H.A.   van Ijzendoorn L.J.  

Thin Solid Films, Vol. 333, Iss. 1, 1998-11 ,pp. : 29-34

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Optical, structural and electrical properties of devicequality hydrogenated amorphous silicon-nitrogen films deposited by plasma-enhanced chemical vapour deposition

By Giorgis F.   Giuliani F.   Pirri C. F.   Tresso E.   Summonte C.   Rizzoli R.   Galloni R.   Desalvo A.   Rava P.  

Philosophical Magazine B, Vol. 77, Iss. 4, 1998-04 ,pp. : 925-944

Taylor & Francis Ltd

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Optical characterization of hydrogenated amorphous carbon (a-C:H) thin films deposited from methane plasma

By Hong J.   Goullet A.   Turban G.  

Thin Solid Films, Vol. 364, Iss. 1, 2000-03 ,pp. : 144-149

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