Thin film deposition by reactive magnetron sputtering: On the influence of target oxidation and its effect on surface properties

Author: Rohde D.   Kersten H.   Hippler R.   Eggs C.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.305, Iss.1, 1997-08, pp. : 164-171

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Abstract