Yttria-stabilized zirconia thin films grown by r.f. magnetron sputtering from an oxide target

By Tomaszewski H.   Haemers J.   De Roo N.   Denul J.   De Gryse R.  

Thin Solid Films, Vol. 293, Iss. 1, 1997-01 ,pp. : 67-74

Elsevier

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Yttria-stabilized zirconia thin films grown by reactive r.f. magnetron sputtering

By Tomaszewski H.   Haemers J.   Denul J.   De Roo N.   De Gryse R.  

Thin Solid Films, Vol. 287, Iss. 1, 1996-10 ,pp. : 104-109

Elsevier

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Influence of substrate temperature and target composition on the properties of yttria-stabilized zirconia thin films grown by r.f. reactive magnetron sputtering

By Boulouz M.   Boulouz A.   Giani A.   Boyer A.  

Thin Solid Films, Vol. 323, Iss. 1, 1998-06 ,pp. : 85-92

Elsevier

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Erratum: ''Yttria-stabilised zirconia thin films grown by reactive r.f. magnetron sputtering'' (Thin Solid Films, 287 (1996) 104-109))

By Haemers J.   Denul J.   De Roo N.   De Gryse R.   Tomaszewski H.  

Thin Solid Films, Vol. 306, Iss. 1, 1997-08 ,pp. : 178-178

Elsevier

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Characterization of yttria-stabilized zirconia thin films grown by planar magnetron sputtering

By Tsai W.-C.   Tseng T.-Y.  

Thin Solid Films, Vol. 306, Iss. 1, 1997-08 ,pp. : 86-91

Elsevier

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