Annealing effects on structural and electrical properties of fluorinated amorphous carbon films deposited by plasma enhanced chemical vapor deposition

By Yi J.W.   Lee Y.H.   Farouk B.  

Thin Solid Films, Vol. 423, Iss. 1, 2003-01 ,pp. : 97-102

Elsevier

Access to resources Recommend Favorite

Structure of plasma-deposited amorphous hydrogenated boron-carbon thin films

By Jacob W.   Annen A.   Sasz M.   Beckmann R.   Von Keudell A.  

Thin Solid Films, Vol. 312, Iss. 1, 1998-01 ,pp. : 147-155

Elsevier

Access to resources Recommend Favorite

Low dielectric fluorinated amorphous carbon thin films grown from C 6 F 6 and Ar plasma

By Yi J.W.   Lee Y.H.   Farouk B.  

Thin Solid Films, Vol. 374, Iss. 1, 2000-10 ,pp. : 103-108

Elsevier

Access to resources Recommend Favorite

Stability of plasma-deposited amorphous hydrogenated boron films

By Jacob W.   Annen A.   Sasz M.   Beckmann R.  

Thin Solid Films, Vol. 300, Iss. 1, 1997-05 ,pp. : 101-106

Elsevier

Access to resources Recommend Favorite

Influence of the process parameters on the properties of hydrogenated amorphous carbon thin films deposited using ECR plasma

By Piazza F.   Arnal Y.   Grambole D.   Herrmann F.   Kildemo M.   Lacoste A.   Relihan G.   Golanski A.  

Thin Solid Films, Vol. 383, Iss. 1, 2001-02 ,pp. : 196-199

Elsevier

Access to resources Recommend Favorite