Amorphous and microcrystalline silicon deposited by hot-wire chemical vapor deposition at low substrate temperatures: application to devices and thin-film microelectromechanical systems

By Conde J.P.   Alpuim P.   Boucinha M.   Gaspar J.   Chu V.  

Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. : 105-111

Elsevier

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Poly-crystalline silicon thin films prepared by plasma-assisted hot-wire chemical vapor deposition

By Liu F.   Zhu M.   Liu J.   Wang L.  

Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. : 182-185

Elsevier

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Effects of dilution ratio and seed layer on the crystallinity of microcrystalline silicon thin films deposited by hot-wire chemical vapor deposition

By Moutinho H.R.   Jiang C.-S.   Perkins J.   Xu Y.   Nelson B.P.   Jones K.M.   Romero M.J.   Al-Jassim M.M.  

Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. : 135-140

Elsevier

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Hot-wire chemical vapor deposition for epitaxial silicon growth on large-grained polycrystalline silicon templates

By Mason M.S.   Chen C.M.   Atwater H.A.  

Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. : 54-57

Elsevier

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Gas phase and surface kinetic processes in polycrystalline silicon hot-wire chemical vapor deposition

By Holt J.K.   Swiatek M.   Goodwin D.G.   Muller R.P.   Goddard W.A.   Atwater H.A.  

Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. : 29-35

Elsevier

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