![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
Author: Koski K. Holsa J. Juliet P.
Publisher: Elsevier
ISSN: 0040-6090
Source: Thin Solid Films, Vol.339, Iss.1, 1999-02, pp. : 240-248
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
Aluminium nitride thin films deposited by DC reactive magnetron sputtering
By Dimitrova V. Manova D. Paskova T. Uzunov T. Ivanov N. Dechev D.
Vacuum, Vol. 51, Iss. 2, 1998-10 ,pp. :
![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
Growth and nanostructure of InN thin films deposited by reactive magnetron sputtering
Thin Solid Films, Vol. 318, Iss. 1, 1998-04 ,pp. :
![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
Structure and Properties of W-Ti Thin Films Deposited by Magnetron Sputtering
Materials Science Forum, Vol. 2016, Iss. 849, 2016-04 ,pp. :