Self-aligned selective-epitaxial-growth SiGe HBTs: process, device, and ICs

Author: Washio K.   Ohue E.   Oda K.   Hayami R.   Tanabe M.   Shimamoto H.   Masuda T.   Ohhata K.   Kondo M.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.369, Iss.1, 2000-07, pp. : 352-357

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Abstract