Water absorption characteristics of fluorinated silicon oxide films deposited by electron cyclotron resonance plasma enhanced chemical vapor deposition using SiH 4 , SiF 4 and O 2

Author： Byun K.-M.   Lee W.-J.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.376, Iss.1, 2000-11, pp. : 26-31

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