Depth profiling and the effect of oxygen and carbon on the photoelectrical properties of amorphous silicon films deposited using tungsten wire filaments

Author： Persheyev S.K.   Goldie D.M.   Gibson R.A.G.   Rose M.J.   Anthony S.   Keeble D.J.   Robb K.   Main C.   Reynolds S.   Zrinscak I.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.395, Iss.1, 2001-09, pp. : 130-133

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