Characterization of Cat-CVD grown Si-C and Si-C-O dielectric films for ULSI applications

Author： Takatsuji K.   Kawakami M.   Makita Y.   Murakami K.   Nakayama H.   Miura Y.   Shimoyama N.   Machida H.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.430, Iss.1, 2003-04, pp. : 116-119

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