MOCVD for complex multicomponent thin films-a leading edge technology for next generation devices

Author： Schumacher M.   Lindner J.   Baumann P.K.   Schienle F.   Solayappan N.   Joshi V.   Araujo C.A.   McMillan L.D.  

Publisher： Elsevier

ISSN： 1369-8001

Source： Materials Science in Semiconductor Processing, Vol.5, Iss.2, 2002-04, pp. : 85-91

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