Deep reactive ion etching of silicon moulds for the fabrication of diamond x-ray focusing lenses

By Malik A M   Fox O J L   Alianelli L   Korsunsky A M   Stevens R   Loader I M   Wilson M C   Pape I   Sawhney K J S   May P W  

Journal of Micromechanics and Microengineering, Vol. 23, Iss. 12, 2013-12 ,pp. : 125018-125024

IOP Publishing

Access to resources Recommend Favorite

Increasing the aperture of x-ray mosaic lenses by freeze drying

By Koch F   Marschall F   Meiser J   Márkus O   Faisal A   Schröter T   Meyer P   Kunka D   Last A   Mohr J  

Journal of Micromechanics and Microengineering, Vol. 25, Iss. 7, 2015-07 ,pp. : 75015-75020

IOP Publishing

Access to resources Recommend Favorite

Photoreflectance characterisation of Ar + ion etched and SiCI₄ reactive ion etched silicon (100)

By Murtagh M.   Lynch S. M.   Kelly P. V.   Hildebrandt S.   Herbert P. A. F.   Jeynes C.   Crean G. M.  

Materials Science and Technology, Vol. 13, Iss. 11, 1997-11 ,pp. : 961-964

Maney Publishing

Access to resources Recommend Favorite

Parabolic crossed planar polymeric x-ray lenses

By Nazmov V   Reznikova E   Mohr J   Saile V   Vincze L   Vekemans B   Bohic S   Somogyi A  

Journal of Micromechanics and Microengineering, Vol. 21, Iss. 1, 2011-01 ,pp. : 15020-15030

IOP Publishing

Access to resources Recommend Favorite

Online monitoring of the passivation breakthrough during deep reactive ion etching of silicon using optical plasma emission spectroscopy

By Leopold S   Mueller L   Kremin C   Hoffmann M  

Journal of Micromechanics and Microengineering, Vol. 23, Iss. 7, 2013-07 ,pp. : 74001-74006

IOP Publishing

Access to resources Recommend Favorite