Related content

Analysis of the stress and interfacial reactions in Pt/Ti/SiO 2 /Si for use with ferroelectric thin films

By Madsen Lynnette   Weaver Louise   Ljungcrantz Henrik   Clark Alison  

Journal of Electronic Materials, Vol. 27, Iss. 5, 1998-05 ,pp. : 418-426

Springer Publishing Company

Access to resources Recommend Favorite

Preparation of Ba 2 Si 2 TiO 8 thin films by magnetron sputtering

By Zhu M.K.   Yang Y.H.   Li X.H.   Wang B.   Wang H.   Yan H.  

Microelectronic Engineering, Vol. 66, Iss. 1, 2003-04 ,pp. : 745-749

Elsevier

Access to resources Recommend Favorite

Formation of C54 TiSi 2 in a cosputtered (Ti+Si) blanket film in the presence of a TiN capping layer

By Pelleg J.   Shor Y.  

Microelectronic Engineering, Vol. 69, Iss. 1, 2003-08 ,pp. : 65-80

Elsevier

Access to resources Recommend Favorite

First-principles calculations of perovskite thin films

By Eglitis R.I.   Heifets E.   Kotomin E.A.   Maier J.   Borstel G.  

Materials Science in Semiconductor Processing, Vol. 5, Iss. 2, 2002-04 ,pp. : 129-134

Elsevier

Access to resources Recommend Favorite

Thermal stability study of NiSi and NiSi 2 thin films

By Zhao F.F.   Zheng J.Z.   Shen Z.X.   Osipowicz T.   Gao W.Z.   Chan L.H.  

Microelectronic Engineering, Vol. 71, Iss. 1, 2004-01 ,pp. : 104-111

Elsevier

Access to resources Recommend Favorite