Analysis of the stress and interfacial reactions in Pt/Ti/SiO 2 /Si for use with ferroelectric thin films

Author: Madsen Lynnette   Weaver Louise   Ljungcrantz Henrik   Clark Alison  

Publisher: Springer Publishing Company

ISSN: 1543-186X

Source: Journal of Electronic Materials, Vol.27, Iss.5, 1998-05, pp. : 418-426

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Abstract