Fabrication of RF MEMS variable capacitors by deep X-ray lithography and electroplating

By Achenbach Sven   Klymyshyn David   Haluzan Darcy   Mappes Timo   Wells Garth   Mohr Jürgen  

Microsystem Technologies, Vol. 13, Iss. 3-4, 2007-02 ,pp. : 343-347

Springer Publishing Company

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Reflectivity test of X-ray mirrors for deep X-ray lithography

By Nazmov V.  

Microsystem Technologies, Vol. 14, Iss. 9-11, 2008-10 ,pp. : 1299-1303

Springer Publishing Company

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Fabrication of Fresnel zone plates with high aspect ratio by soft X-ray lithography

By Liu Longhua  

Microsystem Technologies, Vol. 14, Iss. 9-11, 2008-10 ,pp. : 1251-1255

Springer Publishing Company

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Fabrication method of two-level polymeric microstructure with the help of deep X-ray lithography

By Lee Bong-Kee  

Microsystem Technologies, Vol. 14, Iss. 9-11, 2008-10 ,pp. : 1739-1744

Springer Publishing Company

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Fabrication of microgratings on PMMA plate and curved surface by using copper mesh as X-ray lithography mask

By Li Yigui   Sugiyama Susumu  

Microsystem Technologies, Vol. 13, Iss. 3-4, 2007-02 ,pp. : 227-230

Springer Publishing Company

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