Optimization of the channel doping profile of vertical sub-100 nm MOSFETs

Author: Kaesen F.   Fink C.   Anil K.G.   Hansch W.   Doll T.   Grabolla T.   Schreiber H.   Eisele I.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.336, Iss.1, 1998-12, pp. : 309-312

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Abstract