Optimization of breakdown behaviour and short channel effects in MBE-grown vertical MOS-devices with local channel doping

Author: Fink C.   Anil K.G.   Geiger H.   Hansch W.   Schulze J.   Sulima T.   Eisele I.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.369, Iss.1, 2000-07, pp. : 383-386

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Abstract