Material properties of heteroepitaxial yttria-stabilized zirconia films with controlled yttria contents on Si prepared by reactive sputtering

By Horita S.   Watanabe M.   Umemoto S.   Masuda A.  

Vacuum, Vol. 51, Iss. 4, 1998-12 ,pp. : 609-613

Elsevier

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Yttria-stabilized zirconia (YSZ) heteroepitaxially grown on Si substrates by reactive sputtering

By Hata T.   Sasaki K.   Ichikawa Y.   Sasaki K.  

Vacuum, Vol. 59, Iss. 2, 2000-11 ,pp. : 381-389

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Influence of substrate temperature and target composition on the properties of yttria-stabilized zirconia thin films grown by r.f. reactive magnetron sputtering

By Boulouz M.   Boulouz A.   Giani A.   Boyer A.  

Thin Solid Films, Vol. 323, Iss. 1, 1998-06 ,pp. : 85-92

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Yttria-stabilized zirconia thin films grown by reactive r.f. magnetron sputtering

By Tomaszewski H.   Haemers J.   Denul J.   De Roo N.   De Gryse R.  

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Characterization of yttria-stabilized zirconia thin films grown by planar magnetron sputtering

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Thin Solid Films, Vol. 306, Iss. 1, 1997-08 ,pp. : 86-91

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