Material properties of heteroepitaxial yttria-stabilized zirconia films with controlled yttria contents on Si prepared by reactive sputtering

Author： Horita S.   Watanabe M.   Umemoto S.   Masuda A.  

Publisher： Elsevier

ISSN： 0042-207X

Source： Vacuum, Vol.51, Iss.4, 1998-12, pp. : 609-613

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Improvement of the electrical properties of heteroepitaxial yttria-stabilized zirconia (YSZ) films on Si prepared by reactive sputtering

By Horita S.   Nakajima H.   Kuniya T.  

Vacuum, Vol. 59, Iss. 2, 2000-11 ,pp. : 390-396

Elsevier

Access to resources Recommend Favorite

Yttria-stabilized zirconia (YSZ) heteroepitaxially grown on Si substrates by reactive sputtering

By Hata T.   Sasaki K.   Ichikawa Y.   Sasaki K.  

Vacuum, Vol. 59, Iss. 2, 2000-11 ,pp. : 381-389

Elsevier

Access to resources Recommend Favorite

Influence of substrate temperature and target composition on the properties of yttria-stabilized zirconia thin films grown by r.f. reactive magnetron sputtering

By Boulouz M.   Boulouz A.   Giani A.   Boyer A.  

Thin Solid Films, Vol. 323, Iss. 1, 1998-06 ,pp. : 85-92

Elsevier

Access to resources Recommend Favorite

Yttria-stabilized zirconia thin films grown by reactive r.f. magnetron sputtering

By Tomaszewski H.   Haemers J.   Denul J.   De Roo N.   De Gryse R.  

Thin Solid Films, Vol. 287, Iss. 1, 1996-10 ,pp. : 104-109

Elsevier

Access to resources Recommend Favorite

Characterization of yttria-stabilized zirconia thin films grown by planar magnetron sputtering

By Tsai W.-C.   Tseng T.-Y.  

Thin Solid Films, Vol. 306, Iss. 1, 1997-08 ,pp. : 86-91

Elsevier

Access to resources Recommend Favorite