TDDB characteristic and breakdown mechanism of ultra-thin SiO2/HfO2 bilayer gate dielectrics

Author： Fenfen Tao   Hong Yang   Bo Tang   Zhaoyun Tang   Yefeng Xu   Jing Xu   Qingpu Wang   Jiang Yan  

Publisher： IOP Publishing

ISSN： 1674-4926

Source： Journal of Semiconductors, Vol.35, Iss.6, 2014-06, pp. : 64003-64008

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