Correlation between X-ray micro-diffraction and a developed analytical model to measure the residual stresses in suspended structures in MEMS

Author: Rigo S.   Goudeau P.   Desmarres J.-M.   Masri T.   Petit J.-A.   Schmitt P.  

Publisher: Elsevier

ISSN: 0026-2714

Source: Microelectronics Reliability, Vol.43, Iss.9, 2003-09, pp. : 1963-1968

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